AQUACHEM
SPECIFICATIONS
-
Application : RCA Cleaning Bench
Etching Bench
Develop Bench
Solvent Bench
Si wet etch
Membrane & Micro channel formation
V -Groove -
Product Sample : Si, Sapphire, Glass, Ceramic, etc.
-
Substrate Size : Piece to Max. 8 inch
-
Wafer handle : Cassette type
-
Chemical Bath : PTFE, Quartz or SUS316L
-
Chemical heating : Max. 150℃
-
Sonic : Ultrasonic or Megasonic
-
QDR : N2 bubble, DI shower, overflow
-
Option : Chemical circulation
Cassette agitator
LCSS(Local Chemical Supply System)
Auto fire extinguisher
DI generator
Wet scrubber
Wafer and Cassette dryer -
Control : PC control or Manual control
AQUACHEM - CA
SPECIFICATIONS
-
Application : RCA Cleaning Bench
Etching Bench
Develop Bench
Solvent Bench
Si wet etch
Membrane & Micro channel formation
V -Groove -
Product Sample : Si, Sapphire, Glass, Ceramic, etc.
-
Substrate Size : Piece to Max. 8 inch
-
Wafer handle : Cassette type
-
Chemical Bath : PTFE, Quartz or SUS316L
-
Chemical heating : Max. 150℃
-
Sonic : Ultrasonic or Megasonic
-
QDR : N2 bubble, DI shower, overflow
-
Option : Chemical circulation
Cassette agitator
LCSS(Local Chemical Supply System)
Auto fire extinguisher
DI generator
Wet scrubber
Wafer and Cassette dryer -
Control : PC control or Manual control
AQUACHEM - IN
SPECIFICATIONS
-
Application : RCA Cleaning
Etching
Develop
Solvent -
Product Sample : Glass, Si wafer, Ceramic,…
-
Substrate Size : Max. 5G
-
Wafer handle : Single substrate or Cassette type
-
Chemical Zone :
-
Chemical Circulation & Tank : PTFE, Quartz, PP or SUS316L
-
Chemical heating : Max. 80℃
-
Guide Roller Speed : Adjustable
-
DI Spray Shower Zone :
-
Option : LCSS(Local Chemical Supply System)
Auto fire extinguisher
DI generator
Wet scrubber -
Control : PC control or PLC control