2D Material CVD
GRAPHENE PROCESS
Fully covered graphene over substrate
C60 deposition test data
Raman spectrum
GRABO - W
SPECIFICATIONS
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Application : WS2, MoS2, Graphene,…
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Substrate size & Load capacity : 20mm×20mm & 1sample/run
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Process chamber : Q’tz tube
Q’tz sheath for profile thermocouple
SUS manifold with double inlet rods for gas inlet and profiling T/C
EP treated SUS flange with water cooling -
Heating source : Temperature range : Max. 1,000℃
Tungsten-Halogen lamp & lamp heater
SUS heater housing chamber & water cooling
Heater temperature controller -
Gas(MFC) : Ar, H2, CH4, O2,..etc
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Pump : Rotary pump
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Option : MO source, TMP
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Control : Manual control or PC
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System dimension : 1,200mm(W)×600(D)×1,250(H)
GRABO - BENCH
SPECIFICATIONS
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Application : Alq3, CuPc, NPD, LiF, C60, BCP, PbI2, MAI, Ag, SnO2, MoO,WO, NiO,..
Al, Au, Ag,… -
Substrate size & Load capacity : Max. 400mm×400mm & 1sample/run
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Process chamber : Organic Chamber
Metal Chamber
Perovskite Chamber
Glovebox -
Substrate rotation : 0 to 20 rpm
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Substrate holder : Rotation and heating
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No of effusion cell : 2 to 6ea, Middle temperature 650℃
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No of boats : 2 to 6 ea
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Thickness controller : Q’tz crystal sensor & controller
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Ultimate pressure : < 5.0E-7 Torr (Cryo pump or TMP)
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Option : Co-evaporation,
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Control : Manual control or PC control
GRABO - H
SPECIFICATIONS
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Furnace heater : GRABO-1H :1 zone – 1 number
GRABO-2H : 2 zone – 2 numbers
GRABO-3H : 3 zone – 3 numbers -
Heating element : Kantal wire, Glass wool molding
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Heating zone : 50mm×150mm
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Heater temperature : Max. 1,000℃
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Quartz tube size : GRABO-1H : Ø50mm × 1,200mm
GRABO-2H : Ø50mm × 1,500mm
GRABO-3H : Ø50mm × 1,500mm -
Gas(MFC) : Ar, H2, CH4, O2,..etc
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Pump : Rotary pump
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Option : MO source, TMP
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Control : Manual control or PC