CRYSTAL SI SOLARCELL
6inch Si solar cell Al BSF SEM
Line Configuration
Wet Bench (SOLTEX)
Substrate Thermal Process device
Substrate Thermal Process device
SOLTEX
SPECIFICATIONS
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Configuration : Loader
→ Pre-cleaning bath → DI rinse #1
→ KOH bath → DI rinse #2
→ Acid #1 → DI rinse #3
→ Acid #2 → DI rinse #4
→ Hot DI rinse → Hot air dry
→ Unloader -
Substrate size : 156mm×156mm wafer
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Cassette (LSC) : Max. 100 wafers loading
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LSC transfer : Robot
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System control : Automatic process control by PC
SOLDOP
SPECIFICATIONS
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Frame structure : 1 stack 1 tube type
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Substrate size : 156mm×156mm wafer
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Process tube : Ball-joint type Quartz reactor
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Load station : Automatic loading/unloading by LM guide (Soft landing type)
Max. 400 wafers loading (included dummy wafers) -
Furnace heater : Max. 1,200℃ (at heater surface)
6-zone temperature control -
Process gas : N2, O2 gas for process
N2 gas for source carrier
N2 gas for purge -
Source : 500cc Quartz canister for POCl3 source feeding
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System control : Automatic process control by PC
SOLISO
SPECIFICATIONS
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Substrate holder capacity : 156mm×156mm 300 wafers
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Chamber material : Stainless steel
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Plasma source power : 600W, 13.56MHz (RF)
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Vacuum pump : 33m3/hr, Fomblin oil type
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Process gas : O2, CF4 gas for process
N2 gas for purge -
System control : Automatic process control by PC
SOLARC
SPECIFICATIONS
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Configuration : Load table – Load chamber – Process chamber
– Unload chamber – Unload table -
Tray capacity : 156mm×156mm wafer 9 wafers
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Load chamber : IR lamp pre-heating unit , 350℃
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Process chamber : PE type showerhead
Substrate heater , Max. 400℃ -
Unload chamber : Cooling unit
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Transport unit : Motor
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Plasma source power : 3KW , 13.56MHz (RF)
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Vacuum pump : Load chamber – 500m3/hr Booster + 80m3/hr Rotary pump
Process chamber – 600m3/hr Booster + 80m3/hr Dry pump
Unload chamber – 500m3/hr Booster + 80m3/hr Rotary pump -
Process gas : SiH4, NH3, N2 gas for process
N2 gas for purge -
System control : Automatic process control by PC
SOLIND
SPECIFICATIONS
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Configuration : 5 heating zone
1 cooling zone -
Heat turnel length : Max. 2,000 mm
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Heater typeInstant : Response Open Coil
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Max. temperature : Max. 350℃
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Cold Start Warm-Up Time : 30 min.
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Profile Change Time : 5~10 min.
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Belt type : 6inch stand-up mesh belt
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Conveyor Speed : Dual Speed (13~80cm/min, 80~480cm/min) with toggle switch
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UPS : Battery Backup for Conveyor and PC
SOLFIR
SPECIFICATIONS
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Configuration : Loader station
Multi-zone infrared drying section
Multi-zone infrared firing section
Two stage cooling
Unloader station -
Maximum continuous operating temperature : Firing section – 1000 deg.
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Cross belt temperature uniformity and repeatability : ± 2 deg.
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Temperature ramping rate : Max. 200 deg./sec
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Belt speed : 26-300 ipm (66-762 cm/min)
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Additional options included : VOC Oxidizer
Upgrade to Edge Contact Belt for 156mm wafers
Ultrasonic Belt Cleaner
Critical Spare Parts Kit